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Conferences > OIC > 2016 > ThC > ThC.7

Optical properties, morphology and temperature influence of SiO2, NbO2 and HfO2 films as a function of ion energy and process

William Cote, Maria Slocum, Sheetal Chandra, Markus Fredell, and Thomas Rahmlow

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Abstract

Single films were deposited for three oxides using electron beam and magnetron sputtering with no ion assist, low energy and high energy plasma assisted deposition processes. Refractive index, SEM and temperature stability data are presented for each film.

© 2016 Optical Society of America

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