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Plasma Assisted Pulsed Magnetron Sputtering (PAPMS) of Aluminum Oxide

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Abstract

Sputtering and oxidizing Aluminum needs tight process control to achieve good film quality and high deposition rate. Regulating the cathode voltage indirectly by varying the Oxygen flow in the chamber enables a stable and repeatable Al2O3 process.

© 2016 Optical Society of America

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