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UV Broadband Antireflection Coating Using Al2O3, HfO2 and SiO2 Multilayer by Atomic Layer Deposition

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Abstract

UV broadband antireflection film M2HL in 250~390 nm spectral range was prepared by ALD using HfO2 as H layer. Higher transmittance was acquired when HfO2-Al2O3 nano-laminate replaced of HfO2 in the AR coating.

© 2019 The Author(s)

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