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Design and Fabrication of Reflective Notch Filter Using Modified Thickness Modulated Al2O3 – SiO2 Multilayer

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In the present research work, a 44 layer reflective notch filter using Al2O3 – SiO2 multilayer structure has been designed and optimized for an oblique angle of incidence of 45°. The multilayer structure was then deposited on BK7 substrate using Ion Assisted electron-beam Deposition (IAD) technique and the fabricated filter was characterized for its optical properties using UV-Vis-NIR spectrophotometer.

© 2019 The Author(s)

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