Laser resistance optimization of multilayer dielectric pulse compression gratings by reducing the electric field intensity through the dielectric mirror designs

Saaxewer Diop; Saaxewer Diop; Marine Chorel; Éric Lavastre; Laurent Gallais; Laurent Lamaignère; Nicolas Bonod

doi:10.1364/OIC.2022.ThE.7

Optical Interference Coatings Conference (OIC) 2022
Technical Digest Series (Optica Publishing Group, 2022),
paper ThE.7
•https://doi.org/10.1364/OIC.2022.ThE.7

Laser resistance optimization of multilayer dielectric pulse compression gratings by reducing the electric field intensity through the dielectric mirror designs

Saaxewer Diop, Marine Chorel, Éric Lavastre, Laurent Gallais, Laurent Lamaignère, and Nicolas Bonod

Optical Interference Coatings 2022

Whistler, British Columbia Canada
19–24 June 2022
ISBN: 978-1-957171-04-3

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Laser-Matter Interaction: Gratings and Other Components (ThE)

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S. Diop, M. Chorel, É. Lavastre, L. Gallais, L. Lamaignère, and N. Bonod, "Laser resistance optimization of multilayer dielectric pulse compression gratings by reducing the electric field intensity through the dielectric mirror designs," in Optical Interference Coatings Conference (OIC) 2022, R. Sargent and A. Sytchkova, eds., Technical Digest Series (Optica Publishing Group, 2022), paper ThE.7.

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Abstract

To improve laser damage resistance of multilayer dielectric pulse compression gratings, we numerically evidenced that for a given etching profile, the mirror design can minimize the electric field intensity in pillars with significant variations.

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