Abstract

Various techniques have been used for the fabrication of polymeric channel waveguide for active and passive devices: poling, photobleaching, photolocking, reactive ion etching, etc. Among them, photobleaching offers simple processibility and controllability. Some authors[1,2] have reported on the fabrication of channel waveguides by this tehnique. However, it takes long time, typically on the order of tens to hundreds hours, to bleach out a nonlinear optical polymer (NLO) thin film with the thickness of a few µm using mask aligner.

© 1993 Optical Society of America