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  • International Photonics and OptoElectronics Meeting 2019 (OFDA, OEDI, ISST, PE, LST, TSA)
  • OSA Technical Digest (Optica Publishing Group, 2019),
  • paper PW2D.3
  • https://doi.org/10.1364/PFE.2019.PW2D.3

Synthesis of Graphene Layers by Inductive Coupled Plasma Enhanced Chemical Vapor Deposition (ICP-CVD) for Application in Optoelectronics

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Abstract

The thin films of Ni and Cu have been deposited on SiO2/Si(100) substrates in a thermal evaporator. The graphene layers have been grown on Ni-Cu films under C2H2-H2-Ar plasma under vacuum annealing condition in ICP-CVD.

© 2019 The Author(s)

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