Electron Irradiation Damage to KNbO3

E.R. Hodgson; C. Zaldo; F. Agulló López

doi:10.1364/PMED.1990.AP5

Topical Meeting on Photorefractive Materials, Effects, and Devices II
Technical Digest Series (Optica Publishing Group, 1990),
paper AP5
•https://doi.org/10.1364/PMED.1990.AP5

Electron Irradiation Damage to KNbO₃

E.R. Hodgson, C. Zaldo, and F. Agulló López

Photorefractive Materials, Effects, and Devices II 1990

Aussois France
17–19 January 1990
ISBN:

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Crystal growth and characterization (AP)

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E. R. Hodgson, C. Zaldo, and F. A. López, "Electron Irradiation Damage to KNbO3," in Topical Meeting on Photorefractive Materials, Effects, and Devices II, Technical Digest Series (Optica Publishing Group, 1990), paper AP5.

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Abstract

The optical absorption induced by electron irradiation in KNbO₃ has been investigated with a Van de Graaf accelerator. A well defined threshold energy of 0.35 MeV has been found to induce colouring. A broad band roughly peaked at 450 nm is formed above threshold. The observed coloration has been related to the displacement of oxygen atoms.

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