Optical Damage Resistant Impurities in Lithium Niobate

T.R. Volk; N.M. Rubinina; N.M. Rubinina; S. Stizza; S. Stizza

doi:10.1364/PMED.1991.TuC26

Photorefractive Materials, Effects, and Devices
Technical Digest Series (Optica Publishing Group, 1991),
paper TuC26
•https://doi.org/10.1364/PMED.1991.TuC26

Optical Damage Resistant Impurities in Lithium Niobate

T.R. Volk, N.M. Rubinina, and S. Stizza

Photorefractive Materials, Effects, and Devices II 1991

Beverly, Massachusetts United States
29–31 July 1991
ISBN:

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Poster Session: Materials and Wave Interactions (TuC)

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T. R. Volk, N. M. Rubinina, and S. Stizza, "Optical Damage Resistant Impurities in Lithium Niobate," in Photorefractive Materials, Effects, and Devices, Technical Digest Series (Optica Publishing Group, 1991), paper TuC26.

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Abstract

Magnesium^1-3, zinc^4-6 and some other impurities (substituting mainly for the lithium sites) drastically change optical properties of LiNbO₃. In particular the value of optical damage (photorefraction) in LiNbO₃:Me (Me = Mg,Zn,…) is sharply reduced compared with undoped LiNbO₃^2-6. Similarly Me impurities tend to supress so-called "dark trace” effect^4-6 (that means stable darkening under intensive visible laser radiation).

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