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Large-Area Dense Plasmonic Nanoarrays for Surface Enhanced Raman Applications

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Abstract

Two new techniques for forming dense plasmonic nanoarrays utilizing 157-nm interference lithography on a 90-nm pitch grid include 1) convective assembly of Au nanoparticles into pre-patterned PMMA templates and 2) direct patterning of Ag nanocones.

© 2010 Optical Society of America

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