Ultrafast Photorefractive Process in BSO

J.L. Ferrier; J. Gazengel; G. Rivoire

doi:10.1364/PRM.1987.ThA3

Topical Meeting on Photorefractive Materials, Effects, and Devices
Technical Digest Series (Optica Publishing Group, 1987),
paper ThA3
•https://doi.org/10.1364/PRM.1987.ThA3

Ultrafast Photorefractive Process in BSO

J.L. Ferrier, J. Gazengel, and G. Rivoire

Photorefractive Materials 1987

Los Angeles, California United States
12–14 August 1987
ISBN:

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Ultrafast Photorefractive Effects (ThA)

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J. L. Ferrier, J. Gazengel, and G. Rivoire, "Ultrafast Photorefractive Process in BSO," in Topical Meeting on Photorefractive Materials, Effects, and Devices, Technical Digest Series (Optica Publishing Group, 1987), paper ThA3.

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Abstract

The permanent photorefractive effect induced in Bi₁₂ SiO₂₀ crystals by intense nano and picosecond pulses shows a long rise-time (in the range 10 - 100 ms), and a diffraction efficiency limited to values ~ 5.10^-4.⁽¹⁾⁽²⁾ These limitations are connected with the existence of transient effects characteristic of intense and fast excitations.

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