Abstract
Remarkable progress, within limited wavelength ranges, has been made in the field of normal incidence XUV mirrors. High performance Mo/Si multilayer mirrors exist for wavelengths between 125 and ~250 Å, and reflectivities greater than 60% have been achieved around 130-140 Å.1-4 Good results were also obtained with C and B4C-based multilayer mirrors at wavelengths just above the C and the B K-absorption edges at 44 Å and 67 Å, respectively.5-7 However, there are wavelength regions such as the water window or just below the Si L-edge, where none of the well-established material pairs can achieve reflectivities adequate for many applications. The search for new material pairs to bridge these wavelength gaps has motivated the work that is briefly discussed here.
© 1994 Optical Society of America
PDF ArticleMore Like This
Charles M. Falco, Brian S. Medower, and J. M. Slaughter
ThA.5 Physics of X-Ray Multilayer Structures (PXRAYMS) 1994
Hisataka Takenaka, Tomoaki Kawamura, Yoshikazu Ishii, Tsuneyuki Haga, and Hiroo Kinoshita
EC.26 Extreme Ultraviolet Lithography (EUL) 1994
Ken Skulina, Craig Alford, Richard Bionta, Dan Makowiecki, E. M. Gullikson, Regina Soufli, J. B. Kortright, and J. H. Underwood
EC.52 Extreme Ultraviolet Lithography (EUL) 1994