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  • Conference on Lasers and Electro-Optics/International Quantum Electronics Conference and Photonic Applications Systems Technologies
  • Technical Digest (CD) (Optica Publishing Group, 2004),
  • paper PThC1

Using Singularities and Darkness for Optical Nanolithography

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Light with wavelengths of 248nm and 193nm is used today to manufacture integrated circuits with dimensions <55nm. This optical nanolithography works because of destructive interference, which creates dark features much smaller than a wavelength.

© 2004 Optical Society of America

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