Using Singularities and Darkness for Optical Nanolithography

Marc D. Levenson; Takeaki (Joe) Ebihara

Conference on Lasers and Electro-Optics/International Quantum Electronics Conference and Photonic Applications Systems Technologies
Technical Digest (CD) (Optica Publishing Group, 2004),
paper PThC1

Using Singularities and Darkness for Optical Nanolithography

Marc D. Levenson and Takeaki (Joe) Ebihara

Photonic Applications Systems Technologies Conference 2004

San Francisco, California United States
ISBN: 1-55752-770-9

From the session
Photonics in Nanotechnology I (PThC)

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M. D. Levenson and T. (J. ) Ebihara, "Using Singularities and Darkness for Optical Nanolithography," in Conference on Lasers and Electro-Optics/International Quantum Electronics Conference and Photonic Applications Systems Technologies, Technical Digest (CD) (Optica Publishing Group, 2004), paper PThC1.

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Abstract

Light with wavelengths of 248nm and 193nm is used today to manufacture integrated circuits with dimensions <55nm. This optical nanolithography works because of destructive interference, which creates dark features much smaller than a wavelength.

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