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  • Conference on Lasers and Electro-Optics/International Quantum Electronics Conference and Photonic Applications Systems Technologies
  • Technical Digest (CD) (Optica Publishing Group, 2004),
  • paper PThC2

Extreme ultraviolet lithography: optics – the next generation

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Recent extreme ultraviolet lithography developments from teams at three DOE National Laboratories will be reported, including imaging results from the full-field Engineering Test Stand and the high-numerical-aperture Micro Exposure Tool.

© 2004 Optical Society of America

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