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Fabrication of Ultra Thin Metamaterial Perfect Optical Absorbers by Laser Interference Lithography

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Abstract

Ultra thin metamaterial perfect optical absorbers with near unit value of absorbence at 1064 nm is fabricated by laser interference lithography and lift-off processing. The trilayer metal-dielectric-metal structure can be formed over few mm2 area and the fabrication is cost-effective.

© 2014 Optical Society of America

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