Abstract
We report a new high-resolution technique for detecting the two-dimensional profile of a neutral atomic beam. The profile is measured by collecting the atoms on a substrate that intersects the beam. The substrate is exposed to the atomic beam, and the "photograph" recorded on the substrate is then transferred to a scanning electron microscope, where the topography and thickness of the surface are examined. Variations in the thickness of the accumulated layer can be independently measured by either a surface profilimeter or an electron microscope.
© 1991 Optical Society of America
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