Expand this Topic clickable element to expand a topic
Skip to content
Optica Publishing Group
  • Quantum Electronics and Laser Science Conference
  • OSA Technical Digest (Optica Publishing Group, 1997),
  • paper QFA1

Bright, continuously tunable, VUV plasma source generated by a high repetition rate picosecond KrF laser

Not Accessible

Your library or personal account may give you access

Abstract

Leading edge research in molecular dynamics, pbotoeiectron spectroscopy, surface interactions, and radiobiology has pushed forward the requirement for intense, pulsed, tunable sources of vacuum ultraviolet radiation. Presently, only synchrotron radiation sources (SRS) are sufficiently bright for these applications. A bright, continuously tunable VUV beamline capable of delivering in excess of 3 × 101) photo ns/sec/cm2/1nm BW @100 ran (BW = Δλ/λ is the bandwidth) to the sample was constructed on a plasma source generated by a high repetition rate, picosecond KrF excimer laser system. The beamline output can be increased >100 by improved source coupling.

© 1997 Optical Society of America

PDF Article
More Like This
Plasma Light Source for the VUV Spectral Region

W Shaikh, RM Allott, ICE Turcu, M Folkard, K Prise, K Ledingham, R Donovan, S. Wang, N Takeyasu, and S Huntingdon
QThL5 European Quantum Electronics Conference (EQEC) 1998

High repetition rate, high photon flux VUV source

Anahita Omoumi, Michele Natile, Evangelos Papalazarou, Yoann Zaouter, Marc Hanna, Thierry Auguste, Patrick Georges, and Marino Marsi
cf_1_4 The European Conference on Lasers and Electro-Optics (CLEO/Europe) 2023

PICOSECOND KrF LASER-PLASMA SOURCE GENERATING 1nm X-RAYS AT 1WATT AVERAGE POWER

ICE Turcu, IN Ross, and C McCoard
CPD33 Conference on Lasers and Electro-Optics (CLEO:S&I) 1995

Select as filters


Select Topics Cancel
© Copyright 2024 | Optica Publishing Group. All Rights Reserved