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Optica Publishing Group
  • Quantum Electronics and Laser Science Conference
  • OSA Technical Digest (Optica Publishing Group, 1999),
  • paper QWD2

Third-order susceptibility measurement in silica-based thin film by Zernicke imaging technique

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Abstract

It has been shown1 that the modification undergone by the image given by a Young two-slit object in a 4-f system, in presence of a nonlinear medium, can be used to measure the nonlinear refractive index n2 in various materials. In ref. 1, experimental and theoretical descriptions are reported in detail. Here, we give a brief summary of this method, the so-called Zernicke Imaging Technique (ZIT).

© 1999 Optical Society of America

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