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Conferences > QELS > 2010 > QThE > QThE3

Extraordinary Low Transmission of a Metamaterial for Application in Lithography

S. Dobmann, D. Ploss, D. Reibold, A. Erdmann, and U. Peschel

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Abstract

We present experiments on a metamaterial made from an ultrathin (< 40 nm) metal film. It exhibits extraordinary low transmission due to an antenna resonance and may form building blocks of future lithographic masks.

© 2010 Optical Society of America

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