Abstract

This paper describes a new system for the development of an X-ray laser in the wavelength region from 5 nm to 1 nm utilizing a Powerful Sub-Picosecond Laser (PP-Laser) of expected peak power up to 0.5 TW in a 300 fsec pulse. Soft X-ray spectra generated by the interaction of the PP-Laser beam with different targets are presented and compared to the spectra generated by a much less intense laser beam (20-30 GW). A theoretical model for the interaction of atoms with such a strong laser EM field is also briefly discussed. The development of additional amplifiers for the recombining soft X-ray laser and the design of a cavity are presented from the point of view of applications for X-ray microscopy and microlithography. The overview ends with the presentation of recent results on the quenching of spontaneous emission radiation and its possible effect on the absolute intensity calibration of soft X-ray spectrometers.

© 1988 Optical Society of America