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Conferences > SWV > 1993 > XRLAXR > XRLAXR226

Soft X-Ray Holography Using an X-Ray Laser at 23.2/23.6 nm and 19.6 nm

M. S. Schulz, H. Daido, K. Murai, Y. Kato, R. Kodama, G. Yuan, S. Nakai, H. Iwasaki, T. Yoshinobu, K. Shinohara, I. Kodama, T. Honda, D. Neely, and G. Slark

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Abstract

An x-ray laser at wavelengths of 23.2/23.6 nm and 19.6 nm was used to carry out in-line Gabor holography. Holograms of simple structures, such as thin tungsten and glass fibers and standard electron microscope test specimens, using two types of recording media, PMMA photoresist and Ilford Q-Plates, were obtained. The PMMA samples were initially examined using a differential interference microscope and subsequently using an atomic force microscope (AFM). Also attempted was Fourier Transform (FT) holography using two zone plates (one as the focusing device and the other as the object); the criteria for FT holography are discussed.

© 1993 Optical Society of America

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