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Soft X-ray reduction lithography using a reflection mask

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We have conducted the research work on X-ray projection lithography and have already demonstrated a 0.5 µm replicated pattern using a reflection mask. To obtain smaller features, we have designed a Schwarzschild typed demagnifying objective with a numerical aperture size of 0.1 and fabricated a Mo/B4C multilayer very precisely on its optics.

© 1991 Optical Society of America

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