Abstract
There is great indecision in the semiconductor industry as to what the lithography technology will be for the back half of the 1990's (1995-2000). When applied against an idealized process requirements model, all technologies have problems which make the choice extremely expensive and difficult. Technologies considered are: optical extensions, e beam technologies, ion beam technologies, and x-ray technologies. This paper discusses the main technologies with a description of the advantages and disadvantages.
© 1992 Optical Society of America
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