Expand this Topic clickable element to expand a topic
Skip to content
Optica Publishing Group

Where are We in the Development of Soft X-Ray Projection Lithography?

Not Accessible

Your library or personal account may give you access

Abstract

Since the first suggestion of doing projection lithography with soft x-rays was made by Hawryluk and Seppala, and Silvfast and Wood nearly 4 years ago, there has been a flood of activity on many of the basic principles and technologies. Foremost among these has been the development of high reflectivity coatings for mirrors that operate near 130 angstroms, the demonstration of diffraction-limited reduction imaging over a small field, and the design of high efficiency laser plasmas for compact illumination sources. Current work includes construction and repair of reflection masks, designs for large field cameras, and illuminators to couple them to the source, and development of advanced methods to measure and ultimately fabricate precision spherical and aspherical mirrors for large field cameras.

© 1992 Optical Society of America

PDF Article
More Like This
Reflection Mask Repair for Soft-X-Ray Projection Lithography

A. M. Hawryluk, David P. Gaines, and Diane Stewart
WD3 Soft X-Ray Projection Lithography (SXRAY) 1992

Development of an imaging system for soft x-ray projection lithography

Tanya E. Jewell
MVV1 OSA Annual Meeting (FIO) 1992

The State of Soft X-ray Projection Lithography in Japan

Shigetaro Ogura
MA4 Soft X-Ray Projection Lithography (SXRAY) 1992

Select as filters


Select Topics Cancel
© Copyright 2024 | Optica Publishing Group. All Rights Reserved