Abstract
Since the first suggestion of doing projection lithography with soft x-rays was made by Hawryluk and Seppala, and Silvfast and Wood nearly 4 years ago, there has been a flood of activity on many of the basic principles and technologies. Foremost among these has been the development of high reflectivity coatings for mirrors that operate near 130 angstroms, the demonstration of diffraction-limited reduction imaging over a small field, and the design of high efficiency laser plasmas for compact illumination sources. Current work includes construction and repair of reflection masks, designs for large field cameras, and illuminators to couple them to the source, and development of advanced methods to measure and ultimately fabricate precision spherical and aspherical mirrors for large field cameras.
© 1992 Optical Society of America
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