Abstract

The operating wavelength for a soft-x-ray projection lithography stepper is of considerable interest. However, the choice of wavelength is not a free variable because it will influence other systems parameters. The ideal system would operate at a wavelength where the optics and multilayer mirrors are easy to fabricate, conventional sources exist, resists are sensitive, and resist processing is viable. Having analyzed the choice of wavelength from a systems point of view, we are reporting our results.

© 1992 Optical Society of America