Conceptual Design Of a 60-nm Free-Electron Laser for XUV Projection Lithography*

Richard L. Sheffield; Bruce E. Carlsten; K. C. Dominic Chan; John C. Goldstein; Michael T. Lynch; Brian E. Newnam; Dinh C. Nguyen; Daniel S. Prono; Roger W. Warren

doi:10.1364/SXRAY.1992.PD1

Soft-X-Ray Projection Lithography
Technical Digest Series (Optica Publishing Group, 1992),
paper PD1
•https://doi.org/10.1364/SXRAY.1992.PD1

Conceptual Design Of a 60-nm Free-Electron Laser for XUV Projection Lithography^*

Richard L. Sheffield, Bruce E. Carlsten, K. C. Dominic Chan, John C. Goldstein, Michael T. Lynch, Brian E. Newnam, Dinh C. Nguyen, Daniel S. Prono, and Roger W. Warren

Soft X-Ray Projection Lithography 1992

Monterey, California United States
6–8 April 1992
ISBN:

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R. L. Sheffield, B. E. Carlsten, K. C. Dominic Chan, J. C. Goldstein, M. T. Lynch, B. E. Newnam, D. C. Nguyen, D. S. Prono, and R. W. Warren, "Conceptual Design Of a 60-nm Free-Electron Laser for XUV Projection Lithography*," in Soft-X-Ray Projection Lithography, Technical Digest Series (Optica Publishing Group, 1992), paper PD1.

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Abstract

We present the design and calculated performance for a 20-W XUV-FEL source for 60-nm projection lithography. The compact design features an 85-MeV rf linear accelerator with photoinjector, and a pulsed microwiggler with multifacet resonator optics.

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