Sputtering Deposited Ta/Si Soft X-ray Multilayer Mirror

Shao Jianda; Fan Zhengxiu

doi:10.1364/SXRAY.1992.PD6

Soft-X-Ray Projection Lithography
Technical Digest Series (Optica Publishing Group, 1992),
paper PD6
•https://doi.org/10.1364/SXRAY.1992.PD6

Sputtering Deposited Ta/Si Soft X-ray Multilayer Mirror

Shao Jianda and Fan Zhengxiu

Soft X-Ray Projection Lithography 1992

Monterey, California United States
6–8 April 1992
ISBN:

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S. Jianda and F. Zhengxiu, "Sputtering Deposited Ta/Si Soft X-ray Multilayer Mirror," in Soft-X-Ray Projection Lithography, Technical Digest Series (Optica Publishing Group, 1992), paper PD6.

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Abstract

30 layers of Ta/Si alternative structure prepared by plane magneton sputtering has been ehoosen for 234A x-ray mirror. Its characterizations indicated that it is expected to get the real reflectivity of about 10%.

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