Abstract
Soft x ray projection lithography allows the printing of feature sizes of 1μm and smaller with reasonable depth of focus because the very short wavelength allows a small numerical aperture. Because attainable mirror reflectivities are low in this wavelength region, the number of mirrors has to be kept to a minimum. Here again the low numerical aperture helps. Compared to present deep UV (248nm.) systems, there are a number of clearcut differences that impact the design and the construction of such a system.
© 1992 Optical Society of America
PDF ArticleMore Like This
A. M. Hawryluk and N. M. Ceglio
MB3 Soft X-Ray Projection Lithography (SXRAY) 1992
Tanya E. Jewell
MVV1 OSA Annual Meeting (FIO) 1992
William C. Sweatt
MVV6 OSA Annual Meeting (FIO) 1992