Structural Modification of Mo-Si X-Ray Multilayer Mirrors: Ion-Assisted Sputter Deposition

S. P. Vernon; D. G. Stearns; R. S. Rosen

doi:10.1364/SXRAY.1992.TuB3

Soft-X-Ray Projection Lithography
Technical Digest Series (Optica Publishing Group, 1992),
paper TuB3
•https://doi.org/10.1364/SXRAY.1992.TuB3

Structural Modification of Mo-Si X-Ray Multilayer Mirrors: Ion-Assisted Sputter Deposition

S. P. Vernon, D. G. Stearns, and R. S. Rosen

Soft X-Ray Projection Lithography 1992

Monterey, California United States
6–8 April 1992
ISBN:

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Multilayers (TuB)

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S. P. Vernon, D. G. Stearns, and R. S. Rosen, "Structural Modification of Mo-Si X-Ray Multilayer Mirrors: Ion-Assisted Sputter Deposition," in Soft-X-Ray Projection Lithography, Technical Digest Series (Optica Publishing Group, 1992), paper TuB3.

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Abstract

The structural properties and soft x-ray normal incidence reflectivity of Mo-Si multilayers fabricated using ion-assisted dc magnetron sputter deposition are reported.

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