Abstract

Soft-x-ray projection lithography (SXPL) will use a reflective mask consisting of an x-ray multilayer mirror, patterned with a thin (~50-100 nm) layer of gold. Pattern repair techniques that do not degrade the multilayer mirror reflectivity must be developed if SXPL is to become an acceptable choice for lithography. Mask repair results from both clear and opaque mask repair experiments are discussed and analyzed.

© 1992 Optical Society of America