Expand this Topic clickable element to expand a topic
Skip to content
Optica Publishing Group

Noncontact Wafer Characterization with T-Rays

Not Accessible

Your library or personal account may give you access

Abstract

Recently, Hu and Nuss [1] demonstrated an imaging system using terahertz transients generated by standard optoelectronic methods. We have used this system to measure spatial inhomogeneities in the doping density of epitaxial GaAs films. The absorption of THz radiation by doped semiconductors is a strong function of the conductivity, and as a result we are able to detect small variations in the level of doping with 250 µm spatial resolution. Such information is not easily obtainable by any other method, and this demonstration could lead to improved quality control in the growth of doped semiconductor wafers.

© 1996 Optical Society of America

PDF Article
More Like This
Noncontact wafer doping maps measured with T-rays

D. M. Mittleman, M. C. Nuss, J. Cunningham, and M. Geva
CTuD2 Conference on Lasers and Electro-Optics (CLEO:S&I) 1996

T-ray Profile Mapping for Wafer-scale Die Sorting and Yield Improvement

Anis Rahman
DM4A.3 3D Image Acquisition and Display: Technology, Perception and Applications (3D) 2023

Epitaxial lift-off for wafer-scale CaAs-on-Si semi-monolithic integration

Wei Chang, Mark Goertemiller, Ashish Verma, and Eli Yablonovitch
CFC8 Conference on Lasers and Electro-Optics (CLEO:S&I) 1996

Select as filters


Select Topics Cancel
© Copyright 2024 | Optica Publishing Group. All rights reserved, including rights for text and data mining and training of artificial technologies or similar technologies.