Abstract
This work presents a novel method for obtaining surface infrared spectra with
sub-second time resolution during atomic layer deposition (ALD). Using a rapid-scan
Fourier transform infrared (FT-IR) spectrometer, we obtain a series of synchronized
interferograms (120 ms) during multiple ALD cycles to observe the dynamics of an
average ALD cycle. We use a buried metal layer (BML) substrate to enhance absorption
by the surface species. The surface selection rules of the BML allow us to determine
the contribution from the substrate surface as opposed to that from gas-phase
molecules and species adsorbed at the windows. In addition, we use simulation to
examine the origins of increased reflectivity associated with phonon absorption by
the oxide layers. The simulations are also used to determine the decay in
enhancement by the buried metal layer substrate as the oxide layer grows during the
experiment. These calculations are used to estimate the optimal number of ALD cycles
for our experimental method.
PDF Article
More Like This
Cited By
You do not have subscription access to this journal. Cited by links are available to subscribers only. You may subscribe either as an Optica member, or as an authorized user of your institution.
Contact your librarian or system administrator
or
Login to access Optica Member Subscription