Abstract
An improved type of Dammann grating (DG) that could generate an equal-intensity spot array which has only three phases is proposed. Numerical solutions of and such DGs are given. A two-phase DG manufactured by very-large-scale integration (VLSI) techniques is presented. A phase-shift-interferometry-based technique that measures the intensity and sub-beam phases of beam splitting gratings is proposed. The performance measurements of the manufactured two-phase DG using the proposed technique is carried out.
© 2013 Optical Society of America
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