Abstract

The antireflection properties of V-grooved gratings in (100) crystalline silicon are studied numerically by use of rigorous electromagnetic theory. This study shows that these gratings can exhibit antireflective behavior only for TM-polarized radiation. The V-grooved structures are analyzed as a function of grating period, duty cycle, and depth of a SiO₂ mask layer that is added to the tops of the V-grooved mesas. Specific antireflection grating designs (the duty cycle and depth versus the period) are presented that illustrate TM-polarized reflectivity much less than 10^-3 with periods as high as 80% the wavelength of incident radiation. These designs exhibit good tolerance to fabrication errors and grating’s plane deviations in a planar-diffraction mounting.

© 1998 Optical Society of America

Measurement of duty cycles of metal grating masks formed on dielectric substrates

Hongchao Cao, Changhe Zhou, Jijun Feng, and Jianyong Ma
Appl. Opt. 50(17) 2732-2737 (2011)

Analysis of antireflection-structured surfaces with continuous one-dimensional surface profiles

Daniel H. Raguin and G. Michael Morris
Appl. Opt. 32(14) 2582-2598 (1993)

Antireflection surface structure: dielectric layer(s) over a high spatial-frequency surface-relief grating on a lossy substrate

Elias N. Glytsis and Thomas K. Gaylord
Appl. Opt. 27(20) 4288-4304 (1988)

Polarizing mirror/absorber for visible wavelengths based on a silicon subwavelength grating: design and fabrication

David L. Brundrett, Thomas K. Gaylord, and Elias N. Glytsis
Appl. Opt. 37(13) 2534-2541 (1998)

Antireflection structured surfaces for the infrared spectral region

Daniel H. Raguin and G. Michael Morris
Appl. Opt. 32(7) 1154-1167 (1993)