Abstract
A four-parameter model is presented that describes the relief height response of negative working photo-resists. It is shown that the resist thickness after development is directly proportional to the logarithm of the exposure over a wide range of exposures. A relationship between this thickness and exposure is derived and shown to predict resist response. Resists can usefully record exposures that vary by a factor of 10 million making them ideal materials for recording wide dynamic ranges. Several applications using these unique properties are presented.
© 1972 Optical Society of America
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Robert L. Lamberts
Appl. Opt. 11(1) 33-41 (1972)
J. A. Jenney
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