Abstract

Restrictions imposed by diffraction on schlieren electron density measurements are discussed. Applicability criteria are derived. It is shown that diffraction partly compensates for the advantage of longer wavelengths: while the deflection angles increase with λ², the gain in measuring precision increases only with √λ. The criteria are not restricted to a particular spectral range. However, they were derived with special regard to extending schlieren methods to the far infrared (FIR).

© 1975 Optical Society of America

Computer simulation of schlieren images of rotationally symmetric plasma systems: a simple method

Reinhard Noll, Claus R. Haas, Bruno Weikl, and Gerd Herziger
Appl. Opt. 25(5) 769-774 (1986)

Two-wavelength beam deflection technique for electron density measurements in laser-produced plasmas

Gregory W. Faris and Håkan Bergström
Appl. Opt. 30(16) 2212-2218 (1991)

Electronically swept millimeter-wave interferometer for spatially resolved measurement of plasma electron density

John Howard and David Oliver
Appl. Opt. 45(34) 8613-8620 (2006)

Computer-simulated schlieren optics

Gernot Decker, R. Deutsch, W. Kies, and J. Rybach
Appl. Opt. 24(6) 823-828 (1985)

Quantitative Schlieren Techniques Applied to High Current Arc Investigations

U. Kogelschatz and W. R. Schneider
Appl. Opt. 11(8) 1822-1832 (1972)