Abstract

We introduced a new technique of fabricating optical waveguides by first preferentially etching the waveguide grooves, which can be either cusp-shaped or cup-shaped in cross section, and then filling the grooves with organic films by solution-deposition technique. With the chemical etching technique, perfectly smooth reflecting waveguide walls and well-defined waveguide profiles can be easily produced and reproduced with an accuracy that no other existing fabrication techniques can achieve. In our experiments, silicon was chosen as the base material for possible future integration of optical and electronic components.

© 1975 Optical Society of America

Photonic devices based on preferential etching

Bob Bellini, Jean-François Larchanché, Jean-Pierre Vilcot, Didier Decoster, Romeo Beccherelli, and Antonio d’Alessandro
Appl. Opt. 44(33) 7181-7186 (2005)

Optical properties of (Al,Ga)As/GaAs multiple quantum well planar waveguides and the fabrication of single-mode rib waveguides and directional couplers by reactive ion etching

Myles D. A. MacBean, Osamu Mikami, Christopher D. W. Wilkinson, Prakash Mistry, and John S. Roberts
Appl. Opt. 26(13) 2625-2630 (1987)

GaAs optical waveguide structures at 10.6-μm wavelength

M. S. Chang, W. S. C. Chang, B. L. Sopori, H. R. Vann, M. W. Muller, M. G. Craford, D. Finn, W. O. Groves, and A. H. Herzog
Appl. Opt. 14(7) 1572-1578 (1975)

Tapered edge ridge waveguides for integrated optics

T. R. Ranganath, W. T. Tsang, and S. Wang
Appl. Opt. 14(8) 1847-1853 (1975)

Design, fabrication, and performance of preferential-order volume grating waveguide couplers

Stephen M. Schultz, Elias N. Glytsis, and Thomas K. Gaylord
Appl. Opt. 39(8) 1223-1232 (2000)