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Piecewise interferometric generation of precision gratings

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Abstract

A simple interferometer and associated technique, allowing for sequential exposure of small segments in the writing of a large grating, is described. The increased intensity thus afforded greatly aids in overcoming nonlinear and reciprocity effects in the recording medium. Furthermore, the technique eliminates the need for a large collimator and errors introduced by imperfect collimation. Demonstration gratings written with this technique have shown maximum registration errors of ±35 nm.

© 1977 Optical Society of America

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