Abstract
Freshly prepared samples of evaporated Al + 250 Å of MgF2 on glass were subjected to analysis by Auger electron spectroscopy coupled with surface erosion by Ar+ ion bombardment before and after uv irradiation. The analysis identified C and O on the mirror surfaces prior to irradiation and the addition of Si after uv irradiation in vacuum. The relative amounts of photolyzed surface contaminants were proportional to the observed decrease in mirror reflectance at 1216 Å. The Auger analysis confirmed that a very thin layer of surface contamination and not bulk photolysis in the MgF2 film was responsible for the irradiation induced reflectance loss.
© 1977 Optical Society of America
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