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Chemical–mechanical polishing of low-scatter optical surfaces

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Abstract

Chemical–mechanical polishing experiments produced optical-quality low-scatter surfaces on single-crystal silicon. An alkaline silica hydrosol slurry and preconditioned pitch laps generated high-quality optically flat surfaces after several hours of polishing. The best results produced a λ/34 peak-to-peak surface having a 6-Å rms surface roughness using bowl-feed polishing and a persuader plate.

© 1980 Optical Society of America

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