Abstract

An electron-beam writing apparatus with a computer-processed scanning system has been developed to fabricate various types of microgratings in integrated optical circuits. As one of the most fundamental components, we have fabricated microgratings for high-efficiency guided-beam deflection in As₂S₃ film waveguides. The design procedure was established for both uniform-period gratings and linearly chirped gratings. Uniform-period gratings 0.2 × 1 mm² exhibited excellent optical performance as designed, a diffraction efficiency η ≃ 100%. Chirped gratings exhibited wideband selectivity with high diffraction efficiency. Design and experimental results of microdeflection gratings are discussed in detail.

© 1980 Optical Society of America

Integrated grating circuit for guided-beam multiple division fabricated by electron-beam direct writing

Y. Handa, T. Suhara, H. Nishihara, and J. Koyama
Opt. Lett. 5(7) 309-311 (1980)

Scanning-electron-microscope-written gratings in chalcogenide films for optical integrated circuits

Y. Handa, T. Suhara, H. Nishihara, and J. Koyama
Appl. Opt. 18(2) 248-252 (1979)

Direct writing of optical gratings using a scanning electron microscope

H. Nishihara, Y. Handa, T. Suhara, and J. Koyama
Appl. Opt. 17(15) 2342-2345 (1978)

Electron-beam writing system and its application to large and high-density diffractive optic elements

Shiro Ogata, Masami Tada, and Masahiro Yoneda
Appl. Opt. 33(10) 2032-2038 (1994)

Light deflector using a chalcogenide amorphous loaded LiNbO₃ waveguide

Sakae Zembutsu, Juichi Noda, and Hiroshi Iwasaki
Appl. Opt. 19(6) 937-943 (1980)