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Integrated Fresnel lens on thermally oxidized silicon substrate

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Abstract

Thin film Fresnel lenses have been achieved on SiO2/Si substrates covered with a waveguide layer of Si3N4 grown by low pressure chemical vapor deposition (LPCVD). The phase shift between the different zones is induced by a SiO2 top layer chemically etched. The use of this additional layer having a smaller refractive index than the waveguide results in a saturation of the lens characteristics vs the thickness of the SiO2 layer; this feature associated with the good reproducibility of the LPCVD technology allows good control of the lens characteristics.

© 1981 Optical Society of America

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