Abstract

Linear zone plates with a minimum linewidth of 0.69 μm are fabricated by electron-beam writing and deep UV lithographic techniques. The focusing characteristics are examined for laser beams at 0.633 and 0.86 μm in wavelength. A focal length of 200 m, minimum spot size of 1.0 μm, and a numerical aperture of 0.42 are obtained at λ = 0.633 μm. Possible applications of the present technology to the fabrication of miniaturized focusing elements for opto-electronics are discussed.

© 1984 Optical Society of America

Fabrication of holographic microlenses using a deep UV lithographed zone plate

Hai Ming, Yongan Wu, Jianping Xie, and Toshinori Nakajima
Appl. Opt. 29(34) 5111-5114 (1990)

Efficient zone plate array accessor for optoelectronic integrated circuits: design and fabrication

Kashiko Kodate, Eriko Tokunaga, Yukiko Tatuno, JingLi Chen, and Takeshi Kamiya
Appl. Opt. 29(34) 5115-5119 (1990)

Experimental characterization of focusing by high-numerical-aperture zone plates

Rajesh Menon, Dario Gil, and Henry I. Smith
J. Opt. Soc. Am. A 23(3) 567-571 (2006)

High-performance micro-Fresnel lens fabricated by UV lithography

K. Tatsumi, T. Saheki, T. Takei, and K. Nukui
Appl. Opt. 23(11) 1742-1744 (1984)

Pinhole diffraction holography for fabrication of high-resolution Fresnel Zone Plates

Sankha S. Sarkar, Harun H. Solak, Christian David, and J. Friso van der Veen
Opt. Express 22(2) 1402-1412 (2014)