Abstract

A method of forming a laser damage resistant wide-spectrum antireflective coating on fused silica and other glasses has been developed. The single-layer graded-index coating is deposited from a specific polymer solution which is converted to a porous SiO₂ film. The size of the pores in the film is first reduced by heat treatment to prevent eventual UV scattering. Refractive-index gradation is achieved by grading this non-scattering porosity using a mild etching agent to a depth which is sufficient to smooth the density transition from air to the substrate glass. The resultant coating provides antireflectivity over the entire transmission range of silica extending to wavelengths as short as 250 nm. Laser damage thresholds as high as 9 J/cm² at 350 nm have been demonstrated for this coating on fused silica substrates, which makes it particularly suitable for the optics of high-power lasers.

© 1984 Optical Society of America

Investigations of porous oxides as an antireflective coating for glass surfaces

Bulent E. Yoldas
Appl. Opt. 19(9) 1425-1429 (1980)

High laser damage threshold porous silica antireflective coating

Ian M. Thomas
Appl. Opt. 25(9) 1481-1483 (1986)

Method for the preparation of porous silica antireflection coatings varying in refractive index from 1.22 to 1.44

Ian M. Thomas
Appl. Opt. 31(28) 6145-6149 (1992)

Porous fluoride antireflective coatings

Ian M. Thomas
Appl. Opt. 27(16) 3356-3358 (1988)

Deposition of optically transparent IR reflective coatings on glass

Bulent E. Yoldas and Terry O’Keefe
Appl. Opt. 23(20) 3638-3643 (1984)