Ion-assisted deposition of magnesium fluoride films on substrates at ambient temperatures

Philip J. Martin; Roger P. Netterfield

doi:10.1364/AO.24.1732_1

Applied Optics
Vol. 24,
Issue 12,
pp. 1732_1-1733
(1985)
•https://doi.org/10.1364/AO.24.1732_1

Ion-assisted deposition of magnesium fluoride films on substrates at ambient temperatures

Philip J. Martin and Roger P. Netterfield

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Philip J. Martin and Roger P. Netterfield, "Ion-assisted deposition of magnesium fluoride films on substrates at ambient temperatures," Appl. Opt. 24, 1732_1-1733 (1985)

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Conditions	Refractive index (550 nm)	Extinction coefficient	Absorptance(%)
No ions (ambient temperature)	1.350	<0.0001	<0.1
No ions (300°C)	1.380	<0.0001	<0.1
Ions (H₂O)	1.402	<0.0001	<0.1
Ions(O₂)	1.394	<0.0001	<0.1
Iona (Ar)	1.407	0.0012	1.5

Film	γ (oxygen)	Ref.
SiO₂	0.2	5
MgF₂	0.16	Present
TiO₂	0.12	5
ZrO₂	0.33	6
CeO₂	1.90	7

Conditions	Refractive index (550 nm)	Extinction coefficient	Absorptance(%)
No ions (ambient temperature)	1.350	<0.0001	<0.1
No ions (300°C)	1.380	<0.0001	<0.1
Ions (H₂O)	1.402	<0.0001	<0.1
Ions(O₂)	1.394	<0.0001	<0.1
Iona (Ar)	1.407	0.0012	1.5

Film	γ (oxygen)	Ref.
SiO₂	0.2	5
MgF₂	0.16	Present
TiO₂	0.12	5
ZrO₂	0.33	6
CeO₂	1.90	7

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Applied Optics