Expand this Topic clickable element to expand a topic
Skip to content
Optica Publishing Group

Ionized-cluster-beam deposition of optical interference coatings

Not Accessible

Your library or personal account may give you access

Abstract

Ionized-cluster-beam (ICB) deposition has been used to form metal, dielectric, and compound films for optical coatings. In ICB deposition, it is possible to control the mechanical, crystallographic, and optical properties of films by varying the acceleration voltage and the ion content in the total flux. Experimental results of film deposition by ICB show that optical properties can be improved through proper selection of acceleration voltage and ionization ratio. Applications such as high-reflectance mirrors, AR coatings, and other optical devices have been demonstrated.

© 1985 Optical Society of America

Full Article  |  PDF Article
More Like This
Microstructure of vapor-deposited optical coatings

Karl H. Guenther
Appl. Opt. 23(21) 3806-3816 (1984)

Effects of oxygen content on the optical properties of tantalum oxide films deposited by ion-beam sputtering

H. Demiryont, James R. Sites, and Kent Geib
Appl. Opt. 24(4) 490-495 (1985)

Coatings for optical applications produced by ion beam sputter deposition

Jurgen Becker and Volker Scheuer
Appl. Opt. 29(28) 4303-4309 (1990)

Cited By

You do not have subscription access to this journal. Cited by links are available to subscribers only. You may subscribe either as an Optica member, or as an authorized user of your institution.

Contact your librarian or system administrator
or
Login to access Optica Member Subscription

Figures (7)

You do not have subscription access to this journal. Figure files are available to subscribers only. You may subscribe either as an Optica member, or as an authorized user of your institution.

Contact your librarian or system administrator
or
Login to access Optica Member Subscription

Select as filters


Select Topics Cancel
© Copyright 2024 | Optica Publishing Group. All Rights Reserved