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High-resolution x-ray lithography using a phase mask

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Abstract

A new high-resolution pattern replication method is proposed for an x-ray lithography system. To obtain high resolution, a phase mask is used which gives rise to the phase shift of (n = 0 or 1) for the transmitted waves. This method gives high quality replication even where the conventional transmission–absorption type mask cannot be used effectively due to diffraction. The numerical results and a basic experiment carried out with laser light show the usefulness of this method.

© 1986 Optical Society of America

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