Abstract

The design requirements for a compact electron storage ring that could be used as a soft-x-ray source for projection lithography are discussed. The design concepts of the x-ray optics that are required for collecting and conditioning the radiation in divergence, uniformity, and direction to illuminate the mask correctly and the particular x-ray projection camera used are discussed. Preliminary designs for an entire soft-x-ray projection lithography system that uses an electron storage ring as a soft-x-ray source are presented. It is shown that, by combining the existing technology of storage rings with large collection angle condensers, a powerful and reliable source of 130-Å photons for production line projection x-ray lithography is possible.

© 1993 Optical Society of America

Condenser optics, partial coherence, and imaging for soft-x-ray projection lithography

Gary E. Sommargren and Lynn G. Seppala
Appl. Opt. 32(34) 6938-6944 (1993)

Radiation hardness of molybdenum silicon multilayers designed for use in a soft-x-ray projection lithography system

David P. Gaines, Ronnie C. Spitzer, Natale M. Ceglio, Michael Krumrey, and Gerhard Ulm
Appl. Opt. 32(34) 6991-6998 (1993)

Front-end design issues in soft-x-ray projection lithography

Natale M. Ceglio, Andrew M. Hawryluk, and Gary E. Sommargren
Appl. Opt. 32(34) 7050-7056 (1993)

Multilayer mirror technology for soft-x-ray projection lithography

D. G. Stearns, R. S. Rosen, and S. P. Vernon
Appl. Opt. 32(34) 6952-6960 (1993)

Wavelength considerations in soft-x-ray projection lithography

Andrew M. Hawryluk and Natale M. Ceglio
Appl. Opt. 32(34) 7062-7067 (1993)