Abstract

We developed a new technique for the repair of opaque defects on soft-x-ray projection lithography reflection masks by using ion-beam etching and a thin Si overcoat on the multilayer mirror. This technique clears the defect without damaging the multilayer mirror or introducing an absorptive element into the multilayer. Our procedure uses a beam of low atomic number ions (Si or Ar) of reduced beam energy and a thin Si overcoat to protect the multilayer mirror.

© 1993 Optical Society of America

Mask technologies for soft-x-ray projection lithography at 13 nm

D. M. Tennant, L. A. Fetter, L. R. Harriott, A. A. MacDowell, P. P. Mulgrew, J. Z. Pastalan, W. K. Waskiewicz, D. L. Windt, and O. R. Wood
Appl. Opt. 32(34) 7007-7011 (1993)

Repairing amplitude defects in multilayer-coated extreme-ultraviolet lithography reticles by use of a focused ion beam

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Multilayer mirror technology for soft-x-ray projection lithography

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Radiation hardness of molybdenum silicon multilayers designed for use in a soft-x-ray projection lithography system

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Investigation of distortion and damage of molybdenum–silicon multilayer reflective coatings with high-intensity ultraviolet radiation

Howard A. Bender, William T. Silfvast, Kenneth M. Beck, and Rajiv K. Singh
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