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Determination of the refractive index of a-Si1−xCx:H thin films from infrared absorption spectra

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Abstract

The index of refraction of a-Si1−xCx:H thin films obtained by dc magnetron sputtering was determined by means of IR absorption measurements. Structural and compositional changes that take place by increasing x make the film a mixture of different species, giving an effective value of the refractive index.

© 1993 Optical Society of America

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